Product Features
MX51
The enhanced basic optical performance and easy-operation offer a powerful defect detecting capability.
The optical performance was improved so that the level of brightness in the darkfield observation has been realized 4 times higher* than that of the former model, MX40. *in the recommended configuration |
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A coarse and fine adjustment clutch built into the large-size stage allows the MX51 to operate agilely. |
 MX51-F + MX-SIC6R-2 |
Units designed for the ESD protection*are provided to keep the electrostatic away during the observation.
*An ESD-compatible microscope body, stage, eyepiece and revolving nosepiece are available.
A full array of accessories support the user in realzing the most suitable observation method
Transmitted light illumination unit MX-TILLK To be inserted between the stage(MX-SIC6R2) and the focusing unit base |
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IR (Near-infrared) unit
Suitable for the observation of bonding pads and wafer bumps
Wafer loader AL110-6
Various reflected light illuminators and revolving nosepieces
A wide variety of reflected light illuminators and revolving nosepieces are provided to allow the user to select the most suitable one for specific observation method.
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BX-URA2, BX-RLA2, RX-RLAA |
Manual revolving nosepieces |
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Motorized revolving nosepieces |
Ergonomic and safety features are integrated into one microscope design to mitigate the fatigue during the observation
The main operating functions are arranged on and around the front panel for easy access. The MX51 complies with the industrial standards SEMI S2 and S8. * SEMI: Semiconductor Equipment and Material International SEMI S2 is the guideline for safety, and S8 is the guideline for ergonomics. |
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